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หน้าหลัก >  บุคลากร > รศ.ดร. ไชยา ประสิทธิชัย

รศ.ดร. ไชยา ประสิทธิชัย

fscicyp@ku.ac.th

วุฒิการศึกษา

  • Postdoctoral Fellow (Chemical Engineering), Stanford University, 2011-2014
  • Ph.D. (Materials Chemistry), Northwestern University, 2006-2011
  • B.Sc. (Chemistry with 1st class honor), ม.เกษตรศาสตร์, 2001-2005

งานวิจัย

Thin film growth and Electrochemistry

ผลงานวิจัย

  1. C. Prasittichai and J. T. Hupp “Surface Modification of SnO2 Photoelectrodes in Dye-Sensitized Solar Cells: Significant Improvements in Photovoltage via Al2O3 Atomic Layer Deposition,” J. Phys. Chem. Lett.,2010, 1(10), 1611-1615.
  2. B. D.Yuhas, C. Prasittichai, J. T. Hupp, and M.G. Kanatzidis “Enhanced Electrocatalytic Reduction of CO2 with Ternary Ni-Fe4S4 and Co-Fe4S4-Based Biomimetic Chalcogels” J. Am. Chem. Soc.2011, 133 (40),15854–15857
  3. V. O. Williams, N.C. Jeong, C. Prasittchai , M. J. Pellin and J.T. Hupp “Fast Transporting ZnO-TiO2 Coaxial Photoanodes for Dye-Sensitized Solar Cells Based on ALD-Modified SiO2 Aerogel Frameworks”, ACS Nano, 2012, 6(7), 6185-6196
  4. N. C. Jeong, C. Prasittichai, H. J. Son, R. A. Jensen, C. Y. Lee, O. K. Farha, and J. T. Hupp “Effective Panchromatic Sensitization of Electrochemical Solar Cells: Strategy and Organizational Rules for Spatial Separation of Complementary Light Harvesters on High-area Photo-electrodes “J. Am. Chem. Soc., 2012, 134(48), 19820–19827
  5. H.J. Son, C.Prasittichai, J. E. Mondloch, L. Luo, J. Wu, D. W. Kim, O.K. Farha and J.T. Hupp”Dye Stabilization and Enhanced Photoelectrode Wettability in Water-Based Dye-Sensitized Solar Cells through Post-assembly Atomic Layer Deposition of TiO2” J. Am. Chem. Soc., 2013, 135(31), 11529−11532
  6. C. Prasittichai, J.R. Avila, O.K. Farha and J.T. Hupp “Systematic Modulation of Quantum (Electron) Tunneling Behavior by Atomic Layer Deposition on Nanoparticulate SnO2 and TiO2 Photoanodes ” J. Am. Chem. Soc., 2013, 135(44), 16328-16331
  7. C. Prasittichai, H. Zhou and S. F. Bent “Area Selective Molecular Layer Deposition of Polyurea Films” ACS Appl. Mater. Interfaces, 2013, 5 (24), 13391–13396
  8. F. S. Hashemi, C. Prasittichai and S.F. Bent “A New Resist for Area Selective Atomic and Molecular Layer Deposition on Metal-Dielectric Patterns” J. Phys. Chem. C., 2014, 118 (20), 10957
  9. C. Prasittichai, K.L. Pickrahn, F.S.Hashemi, D.S. Bergsman and S.F. Bent “Improving Area-Selective Molecular Layer Deposition by Selective SAM Removal” Appl. Mater. Interfaces, 2014, 6 (20), 17831–17836
  10. F.S.Hashemi, C.Prasittichai and S.F.Bent “Self-correcting process for high quality patterning by area selective atomic layer deposition” ACS Nano, 2015, 9 (9), 8710-8717
  11. Hashemi F. S., Prasittichai, C., and Bent, S.F. 2014. “A new resist for area selective atomic and molecular layer deposition on metal-dielectric patterns” J. Phys. Chem. C 118(20), 10957-10962.
  12. Prasittichai C., Pickrahn, K.L., Hashemi, F.S., Bergsman, D.S., and Bent, S.F. 2014. “Improving area-selective molecular layer deposition by selective SAM removal” ACS Appl. Mater. Interfaces. 6 (20), 17831-17836
  13. Son H.J., Kim, C.H., Kim, D. W., Jeong, N. C., Prasittichai, C., Luo, L., Wu, J., Farha, O. K., Wasielewski, M. R., and Hupp, J. T. 2015. “Post-assembly atomic layer deposition of ultrathin metal-oxide coatings enhances the performance of an organic dye-sensitized solar cell by suppressing dye aggregation” ACS Appl. Mater. Interfaces, 7 (9), 5150–5159
  14. Hashemi, F.S., Prasittichai, C., and Bent, S.F. 2015. “Self-correcting process for high guality patterning by area selective atomic layer deposition” ACS Nano 9 (9), 8710-8717.